PVD Systems

Physical Vapor Deposition or PVD is a high purity technique for the vacuum deposition of thin-film and nanoparticle coatings. Physical techniques such as sputtering and thermal evaporation (organic or inorganic) are used to generate a vapor of material. Material vapor generated by the source is carried to the substrate at low gas pressure. Upon contact with the substrate, the vapor condenses to form a thin-film. In the case of nanoparticles,  metal vapor generated by sputtering condenses into nanoparticles in the gas phase before reaching the substrate. Nikalyte PVD systems can be used for thin-films, nanoparticles, multilayer stacks, composites etc. to grow unique functional materials.

Compact PVD systems

  • Low cost, compact and flexible PVD system capable of both Nanoparticles and Thin-Film deposition
  • Typical cycle time less than 45 minutes
  • Front loading chamber with confocal CF ports for up to 5 sources and substrate stage options
  • Upward or downward facing source configuration
  • Fully integrated electronics, pumps on system chassis with recipe driven software for process automation

UHV PVD systems

  • UHV PVD system with load-lock and optional bakeout
  • Compatible with Nikalyte UHV nanoparticle, thin-film and third-party sources
  • Confocal CF port geometry for up to 5 sources
  • Substrate stage with rotation, heating and RF/DC biasing options
  • Fully automated and recipe driven software
  • Generate high purity complex materials by combining nanoparticles and thin films

Modular PVD systems

  •  Front loading spacious and Easy Access chamber, ideal for delicate and complex substrates
  • Upward or downward facing source configuration
  • Sample stage with rotation, heating and RF/DC biasing options
  • Flexible substrate type, e.g. powder coating and reel to reel deposition
  • Fully automated and recipe driven software 
  • Compatible with third party sources

Benchtop Nanoparticle system

  • Generate pure metallic or compound nanoparticles including oxides and nitrides.
  • Deposit hydrocarbon free and non-agglomerated nanoparticles
  • Wide choice of materials, including Au, Ni, Ir, and Pt
  • Real time deposition control using a QCM
  • Typical cycle time of 30 minutes
  • Room temperature deposition compatible with delicate substrates like Graphene and Nafion
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