PVD Systems
Physical Vapor Deposition or PVD is a high purity technique for the vacuum deposition of thin-film and nanoparticle coatings. Physical techniques such as sputtering and thermal evaporation (organic or inorganic) are used to generate a vapor of material. Material vapor generated by the source is carried to the substrate at low gas pressure. Upon contact with the substrate, the vapor condenses to form a thin-film. In the case of nanoparticles, metal vapor generated by sputtering condenses into nanoparticles in the gas phase before reaching the substrate. Nikalyte PVD systems can be used for thin-films, nanoparticles, multilayer stacks, composites etc. to grow unique functional materials.
Compact PVD systems
- Low cost, compact and flexible PVD system capable of both Nanoparticles and Thin-Film deposition
- Typical cycle time less than 45 minutes
- Front loading chamber with confocal CF ports for up to 5 sources and substrate stage options
- Upward or downward facing source configuration
- Fully integrated electronics, pumps on system chassis with recipe driven software for process automation
UHV PVD systems
- UHV PVD system with load-lock and optional bakeout
- Compatible with Nikalyte UHV nanoparticle, thin-film and third-party sources
- Confocal CF port geometry for up to 5 sources
- Substrate stage with rotation, heating and RF/DC biasing options
- Fully automated and recipe driven software
- Generate high purity complex materials by combining nanoparticles and thin films
Modular PVD systems
- Front loading spacious and Easy Access chamber, ideal for delicate and complex substrates
- Upward or downward facing source configuration
- Sample stage with rotation, heating and RF/DC biasing options
- Flexible substrate type, e.g. powder coating and reel to reel deposition
- Fully automated and recipe driven software
- Compatible with third party sources
Benchtop Nanoparticle system
- Generate pure metallic or compound nanoparticles including oxides and nitrides.
- Deposit hydrocarbon free and non-agglomerated nanoparticles
- Wide choice of materials, including Au, Ni, Ir, and Pt
- Real time deposition control using a QCM
- Typical cycle time of 30 minutes
- Room temperature deposition compatible with delicate substrates like Graphene and Nafion