Modular deposition solution for your research
The NL FLEX is an ultra-versatile PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. NL-FLEX is capable of accommodating any kind of substrates including reel-to-reel , non-planar and powder coating. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This modular PVD deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.
Key Features
- Generate complex materials by combining nanoparticles and thin films
- Hydrocarbon free nanoparticles using NL-UHV
- Spacious and Easy Access chamber, ideal for delicate and complex substrates
- Upward or Downward facing source configuration
- Compatible with third party sources
- Coating of 3D objects with rotation, heating and biasing options
- Fully automated and recipe driven software
Basic System Configuration
| Size of deposition chamber | 450 x 450 x 450 mm |
| Base Pressure | < 5e – 7 Torr |
| Orientation | Sputter down |
| Sample table | 4-inch wafer, 20rpm rotation |
| Pumping | 700l/s turbo with 7.2m3/hr dry backing pump |
| Valves | Manual valves, shutters and linear drives |
| Control Software | Recipe driven processes, power supply control and data logging |
| In-situ monitoring | Quartz Crystal Microbalance for process monitoring and end point detection |
| Source Port | Up to 6 deposition sources |
| Source Type | Nanoparticle source, Magnetron sputter sources, Mini e-beam evaporator, Thermal boat source K-cells, Ion source, RF Atom source |
Options
- Removable deposition shielding
- Upward facing source geometry
- Sample stage:-
– DC bias for nanoparticle acceleration
– RF bias for sample surface cleaning
– Heating to 800°C
- Automation options for valves, shutters and linear drives
- Adjustable baffle in front of turbo to increase dynamic pressure range for sputtering at lower gas flows
- Separately pumped load-lock with transfer arm
Control Software
The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequence.
Features:
⇒ Fully automated pump down and venting
⇒ Configure Virtual Rack to suit your process
⇒ Easy to add and remove instruments
⇒ Real Time Charting
⇒ Interlock Monitoring
⇒ Recipe Control
⇒ Data Logging Functions
Publications using Nanoparticle Technology
J.C. Walker , S.R. Saranu , A.H. Kean, R.J.K. Wood. DOI : 10.1016/j.wear.2011.01.056
Thangadurai , I. Zergioti , S. Saranu , C. Chandrinou , Z. Yang , D. Tsoukalas , A. Kean , N. Boukos . DOI : 10.1016/j.apsusc.2010.12.001
Ali J. Addie , Mudhafar A. Mohammed , Raid A. Ismail . DOI : 10.1016/j.mssp.2022.106664