Nanoparticles for functional coatings
The NL-UHV Series are nanoparticle deposition sources that deposit pure and alloy nanoparticles in ultra-high vacuum onto your sample, creating functional coatings. Moreover, we can customize the properties of nanoparticle coatings by precisely controlling the size, composition, and structure of the nanoparticles. Furthermore, the NL-UHV is available with the following sources: a single 1” source (NL-D1), a 2” source (NL-D2), or a triple 1” source (NL-D3). Lastly, we can integrate these sources into your existing PVD systems or incorporate them into our custom-built NEXUS and NL-FLEX vacuum system.
Key Features
- Deposit pure and alloy, hydrocarbon-free, non-agglomerated nanoparticles.
- Achieve sub-monolayer or high-porosity 3-D nanocoating.
- The NL-D3 facilitates the deposition of up to three materials, either individually or as alloys, using two or three materials at the same time.
- All sources are compatible with both DC and Pulsed DC power supplies.
- Control the properties of the nanoparticle coatings by adjusting various process parameters, such as gas flow, gas type, magnetron power, and aggregation length (Lg), or by altering the size of the aggregation zone aperture.
Control of Nanoparticle size using NL- QMS
Quadrupole Mass Spectrometer
The NL-QMS mass filter enables real-time scanning or filtering of deposited nanoparticles by mass or diameter, facilitating the optimization of growth conditions.
Highlights
⇒ Adjust the nanoparticle size distribution within the range of 1 – 20 nm.
⇒ Modify the nanocoating layer density from a sub-monolayer to 3D nanoporous coverage, facilitating coatings that range from loosely bound to tightly adherent.
⇒ Manage the nanoparticle shape and structure, transitioning from crystalline to amorphous forms.
⇒ Conduct mass spectrum analysis of nanoparticles in flight, covering a range from 100 – 10 6 amu.
⇒ Implement nanoparticle size filtering with a mass resolution accuracy of +/-2%.
NL- QMS Control Software
The NL-QMS is operated through a simple and user-friendly Windows™ software interface.
Highlights
Data logging for mass spectra
Preloaded mass calibration data for standard materials
Input parameters for novel materials or alloys
Complete control over QMS operations and scanning configurations
Specifications
| Utility | NL-DXX | NL-QMS |
| Mounting Flange | DN160CF | DN160CF |
| Power | 630V DC or Pulsed DC | 100-250Vac 4Amp fuse |
| Gas | Argon/Helium 2-100Sccm | |
| Cooling Jacket | Water or LN2 Flow rate 2l/min (0.52 US GPM) | |
| Pumping | 120L/m (4.2 CFM) Backing pump 300L/m (10.6 CFM) Turbo pump | |
| Aperture plates | 2mm, 3mm, 4mm and 5mm aperture plates supplied as standard |
NL-DXX Options
| Source Options | NL-D1 | NL-D2 | NL-D3 |
| Source Output | 75W dc | 100W dc | 3 x 75W dc |
| Sputter Target | 1 x 1″ | 1 x 2″ | 3 x 1″ |
| Target Thickness | 0.5 – 3mm | ||
Publications
Florian Knabl, Christine Bandl, Thomas Griesser, Christian Mitterer. DOI: 10.1116/6.0003283
Florian Knabl. DOI: 10.34901/mul.pub.2024.129
Elizabeth S. Jones, Dr. Charalampos Drivas, Dr. Joshua S. Gibson, Dr. Jack E. N. Swallow, Dr. Leanne A. H. Jones, Thomas D. J. Bricknell, Dr. Matthijs A. van Spronsen, Prof. Georg Held, Dr. Mark A. Isaacs, Dr. Christopher M. A. Parlett, Prof. Robert S. Weatherup. DOI: 10.1002/cctc.202400239
Florian Knabl, Dominik Gutnik, Prathamesh Patil, Christine Bandl, Tijmen Vermeij, Christian M. Pichler, Barbara Putz, Christian Mitterer. DOI:10.1016/j.vacuum.2024.113724
Edwards, P.J., Khojasteh, M., Halder, A. et al. DOI: 10.1007/s10948-021-06062-y