Compact PVD System
The Cube is a low cost, compact and flexible PVD system that offers nanoparticle deposition capability in addition to standard thin film deposition functionality in one versatile unit. There are two models: the 375 (up to five sources and substrates up to four inches in diameter) and the 300 (up to four sources and substrates up to two inches). Because of their relatively low volumes, the chambers offer rapid pump down and turnaround of around 45 minutes. The Cube is designed with three priorities in mind: cost, functionality, and reliability.
Key Features
- Available sources include magnetrons, nanoparticle, mini-e-beam, thermal boat, atom and ion sources
- Sputter-up or sputter-down configurations
- Rotation, bias, and heating up to 800ºC options
- Turnaround ~ 45 minutes
- Vacuum down to 5E-7 torr
- System chassis containing control systems, power supplies and pumps
- Integrated PC with Spectrum software allows automated process control, complex recipes and datalogging
Cube System Configuration
| Cube 300 | Cube 375 | |
| Size of deposition chamber | 300 x 300 x 300 mm | 375x 375 x 375 mm |
| Base Pressure | < 1e – 6 Torr | < 5e – 7 Torr |
| Orientation | Sputter down / up | Sputter down / up |
| Sample table | 2-inch wafer, 20rpm rotation, RF/DC Bias and heating to 400oC | 4-inch wafer, 20rpm rotation, RF/DC Bias and heating to 800oC |
| Pumping | 80l/s turbo with 7.2m3/hr dry backing pump | 300l/s turbo with 7.2m3/hr dry backing pump |
| Valves | Manual / Automated Valves, Shutters, Linear drives and Pumping Baffle valve | Manual / Automated Valves, Shutters, Linear drives and Pumping Baffle valve |
| Control Software | Recipe driven processes, power supply control and data logging | Recipe driven processes, power supply control and data logging |
| In-situ monitoring | Quartz Crystal Microbalance for process monitoring and end point detection | Quartz Crystal Microbalance for process monitoring and end point detection |
| Source Port | Up to 4 deposition sources | Up to 5 deposition sources |
| Source Type | Nanoparticle source, Magnetron sputter sources, Mini e-beam evaporator, Thermal boat source K-cells, Ion source, RF Atom source | Nanoparticle source, Magnetron sputter sources, Mini e-beam evaporator, Thermal boat source K-cells, Ion source, RF Atom source |
| Uniformity | +/- 2% with sample rotation | +/- 2% with sample rotation |
Control Software
The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequences.
Features:
⇒ Recipe control
⇒ Configure Virtual Rack to suit your process
⇒ Easy to add and remove instruments
⇒ Real Time Charting
⇒ Interlock Monitoring
⇒ Data Logging Functions