Modular PVD system for Nanoparticle & Thin film : NL-FLEX

The NL FLEX is a modular PVD system designed to accommodate flexible, complex substrates, including reel-to-reel, non-planar, and powder coatings. It integrates multiple deposition techniques, including nanoparticle and thin film deposition, and features real-time nanoparticle filtering with a QMS mass filter. With customizable options and advanced process control, it can also be integrated with analytical tools for a fully tailored research solution.

Modular deposition solution for your research

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The NL FLEX is a versatile high vacuum (HV) deposition system designed for flexible, complex substrates, including reel-to-reel, non-planar, and powder coatings, making it ideal for a wide range of research and industrial applications. It integrates multiple deposition techniques, including a 3-headed nanoparticle source using the Terminated Gas Condensation technique, with a QMS mass filter for real-time scanning and filtering of nanoparticles by mass or diameter, ensuring optimized growth conditions and high-quality results. The system also includes Mini E-Beam Evaporator, Magnetron Sputter Source, Thermal Boat Source, and K-cell for controlled thin film deposition. With customizable features such as substrate heating, rotation, biasing, and advanced recipe control software, the NL FLEX offers exceptional flexibility. Fully customizable and scalable for large production, it includes advanced process control and can be integrated with analytical tools, making it ideal for applications in catalysis, energy storage, photonics, and life sciences.

Key Features

  • Generate complex materials by combining nanoparticles and thin films
  • Hydrocarbon free nanoparticles using  NL-UHV
  • Spacious and Easy Access chamber, ideal for delicate and complex substrates
  • Upward or Downward facing source configuration
  • Compatible with third party sources
  • Coating of 3D objects with rotation, heating and biasing options
  • Fully automated and recipe driven software

Basic System Configuration

Size of deposition chamber450 x 450 x 450 mm
Base Pressure< 5e – 7 Torr
OrientationSputter down
Sample table4-inch wafer, 20rpm rotation
Pumping700l/s turbo with 7.2m3/hr dry backing pump
ValvesManual valves, shutters and linear drives
Control SoftwareRecipe driven processes, power supply control and data logging
In-situ monitoringQuartz Crystal Microbalance for process monitoring and end point detection
Source PortUp to 6 deposition sources
Source TypeNanoparticle source, Magnetron sputter sources,
Mini e-beam evaporator, Thermal boat source
K-cells, Ion source, RF Atom source

Options

  • Removable deposition shielding 
  • Upward facing source geometry
  • Sample stage:-

           – DC bias for nanoparticle acceleration

           – RF bias for sample surface cleaning

           – Heating to 800°C

  • Automation options for valves, shutters and linear drives
  • Adjustable baffle in front of turbo to increase dynamic pressure range for sputtering at lower gas flows
  • Separately pumped load-lock with transfer arm
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Control Software

Spectrum Software Brochure

The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequence.

Features:

⇒ Fully automated pump down and venting

⇒ Configure Virtual Rack to suit your process

⇒ Easy to add and remove instruments

⇒ Real Time Charting

⇒ Interlock Monitoring

⇒ Recipe Control

⇒ Data Logging Functions

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