Modular PVD system for Nanoparticle & Thin film : NL-FLEX

Non-planar & planar, powder coating and reel-to-reel deposition system

Modular deposition solution for your research

The NL FLEX is an ultra-versatile PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. NL-FLEX is capable of accommodating any kind of substrates including reel-to-reel , non-planar and powder coating. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This modular PVD deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

Key Features

  • Generate complex materials by combining nanoparticles and thin films
  • Hydrocarbon free nanoparticles using  NL-UHV
  • Spacious and Easy Access chamber, ideal for delicate and complex substrates
  • Upward or Downward facing source configuration
  • Compatible with third party sources
  • Coating of 3D objects with rotation, heating and biasing options
  • Fully automated and recipe driven software

Basic System Configuration

Size of deposition chamber450 x 450 x 450 mm
Base Pressure< 5e – 7 Torr
OrientationSputter down
Sample table4-inch wafer, 20rpm rotation
Pumping700l/s turbo with 7.2m3/hr dry backing pump
ValvesManual valves, shutters and linear drives
Control SoftwareRecipe driven processes, power supply control and data logging
In-situ monitoringQuartz Crystal Microbalance for process monitoring and end point detection
Source PortUp to 6 deposition sources
Source TypeNanoparticle source, Magnetron sputter sources,
Mini e-beam evaporator, Thermal boat source
K-cells, Ion source, RF Atom source

Options

  • Removable deposition shielding 
  • Upward facing source geometry
  • Sample stage:-

           – DC bias for nanoparticle acceleration

           – RF bias for sample surface cleaning

           – Heating to 800°C

  • Automation options for valves, shutters and linear drives
  • Adjustable baffle in front of turbo to increase dynamic pressure range for sputtering at lower gas flows
  • Separately pumped load-lock with transfer arm
Download Brochure

Control Software

Spectrum Software Brochure

The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequence.

Features:

⇒ Fully automated pump down and venting

⇒ Configure Virtual Rack to suit your process

⇒ Easy to add and remove instruments

⇒ Real Time Charting

⇒ Interlock Monitoring

⇒ Recipe Control

⇒ Data Logging Functions

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