Nanoparticle & Thin film UHV Deposition System : NEXUS

The NEXUS is an ultra-high vacuum PVD system that integrates multiple deposition techniques, including nanoparticle and thin film deposition. Featuring real-time nanoparticle filtering with a QMS mass filter, customizable options, and advanced process control, it’s ideal for both industry and academic research

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The NEXUS is a versatile ultra-high vacuum (UHV) deposition system designed for a wide range of research and industrial applications. It combines multiple deposition techniques, including a 3-headed nanoparticle source using the Terminated Gas Condensation technique, while the QMS mass filter enables real-time scanning and filtering of nanoparticles by mass or diameter, optimizing growth conditions for consistent, high-quality results. The system also includes a Mini E-Beam Evaporator, Magnetron Sputter Source, Thermal Boat Source, and a K-cell for controlled thin film deposition. With customizable features such as substrate heating, rotation, biasing, and advanced recipe control software, the NEXUS offers exceptional flexibility. Additional options like a load lock and add-ons enhance process control and enable integration with analytical tools, making it ideal for applications in catalysis, energy storage, photonics, and life sciences.

Key Features

  • Generate complex materials by combining nanoparticles and thin films
  • Hydrocarbon free nanoparticles using  NL-UHV
  • UHV system with load-lock, bakeout and pumping upgrade option
  • Combination turbo/dry backing pumping
  • Confocal port geometry for up to 5 sources
  • Compatible with third party sources
  • Coating of substrates with rotation, heating and biasing options
  • Interlocks to protect both personnel and equipment
  • Fully automated and recipe driven software

Basic System Configuration

Size of deposition chamber450 mm
Base Pressure< 5e – 7 Torr
OrientationSputter up
Sample table4-inch wafer, 20rpm rotation, Z-shift for sample loading/unloading
Pumping300l/s turbo with 7.2m3/hr dry backing pump
ValvesManual valves, shutters and linear drives
Control SoftwareRecipe driven processes, power supply control and data logging
In-situ monitoringQuartz Crystal Microbalance for process monitoring and end point detection
Source PortUp to 5 deposition sources 2 Confocal CF150 and 3 confocal CF100 source ports
Source TypeNanoparticle source, Magnetron sputter sources,
Mini e-beam evaporator, Thermal boat source
K-cells, Ion source, RF Atom source

Options

  • 5e – 9 Torr base pressure (With bakeout option)
  • Sample stage:-

– DC bias for nanoparticle acceleration

– RF bias for sample surface cleaning

– Heating to 800°C

  • Pumping – 700l/s turbo
  • Separately pumped load-lock with transfer arm
  • System bakeout
  • Automation options for valves, shutters and linear drives
  • Adjustable baffle in front of turbo to increase dynamic pressure range for sputtering at lower gas flows
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NEXUS System Configuration Options

Control Software

Spectrum Software Brochure

The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequence.

Highlights

⇒ Fully automated pump down and venting

⇒ Configure Virtual Rack to suit your process

⇒ Easy to add and remove instruments

⇒ Real Time Charting

⇒ Interlock Monitoring

⇒ Recipe Control

⇒ Data Logging Functions 

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