Circular Magnetrons for Ultra High Vacuum Applications
Key Features
- Bakeable upto 250°C (no need to remove magnets)
- Excellent target utilization of up to 40%
- Standard and high-strength magnets for magnetic materials
- Options for balanced or unbalanced magnet configurations
- Simple bayonet clamp for straightforward target mounting
- Includes a choice between manual or pneumatically controlled shutter
- Available sputter target sizes: 1-inch, 2-inch, and 3-inch
- User-friendly design with easily exchangeable magnets
- Customizable in-vacuum length
- Compatible with DC, RF, Pulsed DC (unipolar or bipolar), and HiPIMS power supplies
Specifications
| Stellar Source | 1.0″ | 2.0″ | 3.0″ |
| Mounting Flange (CF (O.D.) | 4.5″ 114mm NW63CF | 6.0″ 152mm NW100CF | 6.0″ 152mm NW100CF |
| UHV compatible | Yes, bakeable up to 250°C (no need to remove magnets) | ||
| In-vacuum length | 200mm or 300mm – special length on request | ||
| In-vacuum diameter of source head | 45mm | 72mm | 93mm |
| Target size | 1.0″ (25mm) | 2.0″ (50mm) | 3.0″ (75mm) |
| Target thickness (non-magnetic targets with standard magnets) | Up to 3mm | Up to 3mm | Up to 3mm |
| Target thickness (non-magnetic targets with strong magnets) | n.a. | Up to 7mm | Up to 7mm |
| Target thickness (magnetic targets with strong magnets) | Not available – 0.4mm with standard magnetics | Up to 1mm | Up to 2mm |
| Magnets | For magnetic or non-magnetic materials, balanced or unbalanced, easily exchanged by the user | ||
| Power supply | DC, RF, Pulsed DC (unipolar or bipolar), HiPIMS | ||
| Shutter | Integral manual or optional pneumatically operated | ||
| Cooling | Minimum water flow of 1 I/min | ||